The Role of Catalyst Adhesion in ALD-TiO2 Protection of Water Splitting Silicon Anodes.
Authors of this article are:
Tang-Kong R, Winter R, Brock R, Tracy J, Eizenberg M, Dauskardt RH, McIntyre PC.
A summary of the article is shown below:
Atomic layer deposited titanium dioxide (ALD-TiO2) has emerged as an effective protection layer for highly efficient semiconductor anodes which are normally unstable under the potential and pH conditions used to oxidize water in a photoelectrochemical cell. The failure modes of silicon anodes coated with an Ir/IrO x oxygen evolution catalyst layer are investigated, and poor catalyst/substrate adhesion is found to be a key factor in failed anodes. Quantitative measurements of interfacial adhesion energy show that the addition of TiO2 significantly improves reliability of anodes, yielding an adhesion energy of 6.02 ± 0.5 J/m2, more than double the adhesion energy measured in the absence of an ALD-TiO2 protection layer. These results indicate the importance of catalyst adhesion to an interposed protection layer in promoting operational stability of high efficiency semiconducting anodes during solar-driven water splitting.
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This article is a good source of information and a good way to become familiar with topics such as:
adhesion;atomic layer deposition;failure mode;isotope;water oxidation
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